Used KLA / TENCOR SP3 #293648610 for sale

KLA / TENCOR SP3 is a mask and wafer inspection equipment which is used to detect defects on semiconductor wafers and masks. The system utilizes machine vision technology and includes inspection, defect review, yield enhancement and prober automation functions. KLA SP-3 combines brightfield and darkfield imaging with a robotic arm that moves the wafer into different imaging positions. It is designed to detect defects that traditional 2D mask inspection systems may overlook, like line edge roughness and scratches. TENCOR SP 3 utilizes brightfield and darkfield imaging for measuring line edge roughness and scratches. For brightfield imaging, the unit magnifies the image of the wafer to enable detection of micron level line edge roughness and multiple abnormal surface defects. Darkfield image processing helps to detect foreign materials and other potential defects like chips. The machine also includes a sophisticated illuminator with uniform exposure and textured light to ensure accurate resist pattern images. The tool is equipped with fine alignment software to ensure precise imaging. It also features asset-level automation features which utilize the robotic arm to rotate the wafer into the optimal viewing position for better imaging. This allows the model to quickly and accurately scan the entire wafer for defects. TENCOR SP-3 has a compact design and can easily fit into any wafer fabrication line. It connects to standard Ethernet, USB, and RS232 ports for integration with other systems. The equipment is capable of detecting various types of defects with high sensitivity, including hydrophobic, surficial, and narrow patterns. When defects are detected, the system records the data with precise information regarding their type and location. KLA SP3 also includes yield enhancement algorithms that can detect types of defects that may not be visible to other systems. This allows the user to maximize yield and reduce costs. The unit is easy to use and includes a user-friendly graphical user interface to view inspection data. Overall, KLA SP 3 is an advanced mask and wafer inspection machine that offers precise detection of defects and helps improve product yields. It utilizes machine vision technology and advanced automation features to quickly and accurately detect defects. It also includes user-friendly graphical interface that facilitates easy data viewing.