Used KLA / TENCOR SP3 #9251594 for sale

KLA / TENCOR SP3 is a mask and wafer inspection equipment that provides non-destructive, high-resolution analysis of photomasks and wafers. The system offers a dual-beam technology with a NA 0.85 brightfield/darkfield two-lens configuration and optical engraving. It allows users to access, manage and analyze photomasks and wafers at any stage of the design process and verify proper function prior to being committed to mass production. KLA SP-3 unit has several built-in features and components that enable its speedy and precise performance. Its high-resolution area scan cameras (HS-Cameras) and multiple optics provide an excellent imaging capability with a low pixel noise level. The machine also features intelligent focussing technology which accelerates the focus process and produces higher quality images with improved detection performance. An integrated software environment enables users to set up, monitor and store automated processes with a user-friendly interface. The tool is available in three configurations; a solid state single camera, dual camera asset and a full model that includes both cameras and a scanner. The equipment also features an auto alignment system that allows the user to align the pattern quickly and accurately to ensure that the exact pattern is being inspected. It also has automated defect control capabilities that can detect and classify defects quickly and accurately. TENCOR SP 3 is designed to accurately and thoroughly inspect mask and wafer surfaces. Its innovative features provide automated processes for examining device features quickly and precisely. As a result, KLA SP3 unit enables accurate and comprehensive identification of defects in microstructures that are typically invisible to manual inspection. The machine is capable of identifying defects with an accuracy of one micron or less, and can rapidly identify weak-to-moderate defects on contact and non-contact surfaces. Its high-detection sensitivity and accuracy make it an ideal tool for advanced photomask and wafer analysis.