Used KLA / TENCOR SP3 #9312910 for sale

KLA / TENCOR SP3 is a mask and wafer inspection equipment for semiconductor fabrication. It allows manufacturers to quickly and accurately detect defects in semiconductor structures and substrates down to a resolution as small as 0.5µm, resulting in significantly improved product yields. The system utilizes state-of-the art scanning electron microscope (SEM) and laser technology to detect and inspect both top-down and cross-sectional images of the wafer or mask. It uses a high resolution detector to acquire a wide range of images, from high magnification to overview. Using its laser confocal MO imaging, KLA SP-3 is able to capture images of even the most intricate features, such as masks and multi-layer oxide layers. The unit is also equipped with powerful defect detection algorithms that can detect a wide range of defects, including axial alignment, doping, pattern shift, particles, scratches, and voids. It utilizes a combination of conventional imaging technologies such as contrast detection, glow discharge imaging, and scanning electron microscopy to detect even the smallest defects. The machine is also equipped with sophisticated reverse engineering capabilities. It can trace the process steps that create a feature and then decode the underlying production or design intent using input from reverse engineers from the customer's engineering team. In addition, TENCOR SP 3 has a library of process board layouts, enabling the tool to analyze and record the pattern details of all boards in production line. It also offers a detailed review of lithography variations, allowing manufacturers to detect process variations quickly in order to make appropriate corrective adjustments. KLA / TENCOR SP 3 also features a valuable built-in library of statistical trend analysis and reporting capabilities that can be used to monitor the processes and trends over time. Finally, the asset includes workflow automation technology. This allows the model to automatically recognize operational stalling points in production and alert the manufacturer to the need for a response. The automation helps to reduce overall inspection times and increase yield. Overall, KLA SP3 equipment is an advanced, state-of-the-art solution for mask and wafer inspection and process optimization. It offers a reliable and accurate way to detect small defects, pinpoint process variations, and analyze trends in production over time.