Used KLA / TENCOR Spectra CD 100 #9269260 for sale

KLA / TENCOR Spectra CD 100 is a mask & wafer inspection equipment designed to detect defects and any other irregularities in photomasks and wafers. It has a multi-axis optical head that enables it to provide automated three-dimensional imaging, detailed defect inspection and data analysis. The system is equipped with a high-end optics suite and an advanced defect detection algorithm that enable it to detect even the smallest defects on a mask or a wafer. KLA Spectra CD 100 utilizes the proprietary 'Electron Beam Inspection' (EBI) technique to inspect mask and wafer surfaces for defects. This technique involves using a scanning electron beam to create a topographical image of the mask or wafer surface which can then be used to detect and quantify defects. TENCOR SPECTRACD 100 can achieve a resolution of up to 0.2 μm, making it capable of detecting even the smallest of defects. In addition to the defect detection capabilities of the unit, Spectra CD 100 also provides detailed analysis of the mask and wafer surfaces. It offers three-dimensional imaging and surface profiling capabilities, allowing users to visualize and analyze the surfaces in depth. The machine is also capable of offering throughput of up to 500 wafers/hour and features various tools that enable it to reduce cost and improve production. The tool is designed to meet the required standards (JEDEC, SEMI, and MIL-STD) of the semiconductor industry. It offers a comprehensive suite of software tools that enable users to analyze data from up to 1000 wafers per hour. The software includes comprehensive reporting capabilities, real-time defect analysis, self-monitoring sensors, and multiple user logins. KLA / TENCOR SPECTRACD 100 is an ideal choice for inspecting masks and wafers in the semiconductor industry. It ensures high levels of accuracy, cost savings, and improved production throughput, making it a great choice for mask and wafer inspection.