Used KLA / TENCOR Spectra CD-XT #9308718 for sale

KLA / TENCOR Spectra CD-XT is a comprehensive mask and wafer inspection equipment designed for semiconductor fabrication. The system incorporates a wafer stage, light source, and sensor package for high-resolution imaging to detect defects on the mask and wafer. At the core of the unit is KLA high-performance line-by-line laser illumination, which enables high-resolution, real-time analysis of defects at sub-nanometer resolutions. The machine is optimized for advanced technologies, such as multi-layer inspections, metal line inspections, and process control. The automated inspection process helps increase process convergence and productivity while reducing the cycle time. The tool has a standard configuration consisting of four cameras and two laser light sources that provide wide coverage of the wafer. The asset can accommodate up to eight cameras and three laser light sources. The model has two feature extraction algorithms that enable inspection of 1-D, 2-D or 3-D surfaces, as well as defect characterization including type, position and size. KLA Spectra CD-XT also provides advanced metrology and defect classification capabilities, such as feature matching and slicing. The innovative feature extraction capabilities enable the inspection of sub-wavelength structures, including those built for 3D structures, allowing for greater accuracy in identifying pattern defects. In addition, the equipment features an integrated analysis and reporting environment, which includes data analysis, quality control, and process monitoring. This allows users to monitor, control, and analyze process flows as well as quickly identify and address issues. The system includes a user-friendly interface that allows users to easily control the unit and apply processes to the wafer. TENCOR SPECTRA CD XT is a powerful mask and wafer inspection machine that can accommodate a variety of processes and technologies. By providing advanced metrology and defect classification, the tool is designed to enable greater performance and accuracy in detecting defects. This helps to ensure higher yield and quality of integrated semiconductor circuits.