Used KLA / TENCOR Spectra CD #9248732 for sale

KLA / TENCOR Spectra CD
ID: 9248732
Vintage: 2001
Film thickness measurement system With F5x + CD (scatterometry) options Pentium processor, 800 Mhz OS: Win NT Measurement modes: DBS and SE Cognex 8100 Vacuum chuck, 12" Single open cassette loader, 8"-12" Pre-aligner 2001 vintage.
KLA / TENCOR Spectra CD is a mask and wafer inspection equipment created by KLA. It is designed to quickly and accurately detect defects in masks and wafers to enable the efficient manufacture of integrated electronic circuits. KLA Spectra CD system uses full-field inspection to identify and analyze defects on both photomask and wafer surfaces. A full-field inspection provides an extremely detailed image of the surface inspected. It is also able to detect both planar defects and three-dimensional surface irregularities. The unit is capable of capturing images from different illumination angles to further enhance defect detection accuracy. TENCOR SPECTRACD can process a variety of substrates, including silicon wafers, hard-contact masks, and organic materials such as polyimide or PDMS. To achieve the highest level of aid detection, the machine uses a combination of scatterometry, spectroscopy, and scatter imaging to analyze the wafer or mask surface with a high degree of accuracy. The tool has the ability to detect defects as small as 40 nm in size and with a contrast difference of less than .003. In addition to defect detection capabilities, SPECTRACD asset is able to analyze the overall accuracy and shape of the wafer or mask surface. This process helps to ensure that the masks and wafers produced are of the highest quality and able to perform optimally when used as part of an integrated circuit. The model is also capable of analyzing the difference in refractive index between the substrate and the layer on top, helping to identify defects that would otherwise go unnoticed. It is also able to inspect through several layers of ultra-thin material, enabling it to detect errors in the mask or wafer that would otherwise be undetectable. KLA / TENCOR SPECTRACD equipment is extremely easy to use and can be quickly set up and ready to use. The system also includes a suite of advanced analysis tools, allowing users to quickly and accurately analyze the results of their inspections. KLA SPECTRACD unit has been widely used to ensure the efficient production of integrated circuits. It is widely considered to be one of the most reliable and comprehensive mask and wafer inspection systems available, helping to ensure that high-quality chips are produced in a timely and cost-effective manner.
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