Used KLA / TENCOR Spectra CD #9251386 for sale

KLA / TENCOR Spectra CD is a mask and wafer inspection equipment that provides the highest levels of automated, integrated defect detection and defect classification. It offers 3-D surface and overlay metrology, defect imaging and review, resist profiling and systematic defect classification. This system is designed to help mask shops and integrated device manufacturers (IDMs) improve yields, while minimizing the human resources needed to inspect masks and wafers. KLA Spectra CD unit enables precise, automated alignment of the wafer or mask, so that the best possible results can be achieved. This alignment includes automated stitches of multiple images to ensure that defects can be accurately identified, regardless of their exact location. In addition, the machine can detect and classify defects at very low thresholds, allowing for the highest level of accuracy in its analysis. The tool uses automated vision-based detection and 3-D analysis technologies to measure and classify defects from the mask and wafer surfaces. With advanced filters and automation tools, the asset can rapidly identify particle, void and line defects on the mask and wafer surfaces. Once defects have been identified, it can then classify them into distinct feature types, such as peeling and deformation among others, thus giving a complete understanding of the types of defects on a given substrate. In addition, TENCOR SPECTRACD model offers automated resist profile measurement and comparison capabilities. This allows users to measure and compare the thickness of different layers, thus providing invaluable information to optimize processes and increase yield. The equipment is also equipped with advanced flexible imaging technologies, including epi, darkfield and brightfield capabilities, which give users a true visual representation of what is happening on the masks and wafers. KLA SPECTRACD system integrates with other systems, such as operational and process control systems, to ensure a higher level of automation and consistency. It also supports full defect historical tracking and reporting, so that process results can be tracked over time, further enhancing yield optimization. Overall, SPECTRACD is an impressive and highly capable unit for mask and wafer inspection. With its highly advanced and automated vision-based detection and 3-D analysis capabilities, as well as its flexible imaging technologies, it provides the highest possible yield improvements and defect identification. Furthermore, its automated alignment, defect classification, resist profile measurement, and integration capabilities make it an ideal choice for any mask company or IDM seeking to improve yields and consistency.