Used KLA / TENCOR STARlight 301 #116791 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 116791
Inspection system, parts system
(1) Channel
KT9X
Missing back-end inspection station
Installed
Can be inspected.
KLA / TENCOR STARlight 301 is a powerful and versatile mask and wafer inspection equipment designed for inspecting integrated circuits and photomasks. KLA STARlight 301 system includes both wafer and mask inspection capabilities, making it ideal for detecting defects, identifying part numbers and labels, and obtaining statistical data. The unit features a full range of shot size and field size options, allowing it to deliver a high level of speed and accuracy even when intricate features are being inspected. Its advanced imaging capabilities and built-in feature library support the inspection of defects in finer and more intricate features. Furthermore, KLA software allows users to tailor the inspection results to their specific application. The machine is designed to accommodate different patterns, substrates and feature sizes. Complimentary software packages provide the tools needed to get the most out of the tool, including tools for wafer alignment, defect assessment, and data reporting. TENCOR STARlight 301 also offers both online and offline programming capabilities, as well as advanced alignment solutions for fast and reliable setup. STARlight 301 offers users a wide variety of inspection techniques. From high-speed cross-sectioning to ultra-high magnification imaging, this asset has the capability to detect small defects, features as small as 15 nm, and other features of critical importance in the semiconductor industry. TENCOR advanced algorithms provide accurate and reliable results, which are then reported in an easy to read format. The analysis engine allows you to view the data in various formats, facilitating quick decision-making, and end-of-line validation results are stored for future use. In summary, KLA / TENCOR STARlight 301 offers advanced mask and wafer inspection capabilities. It features a range of shot and field sizes that support fast and accurate inspections of various substrate and feature sizes. Its advanced imaging capabilities and software packages provide users with the tools needed to maximize the model's potential. In addition, this equipment has the capability to detect small defects, features as small as 15 nanometers and offer online or offline programming capabilities.
There are no reviews yet