Used KLA / TENCOR STARlight 301 #9049801 for sale

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ID: 9049801
Vintage: 1997
Automatic photomask inspection system 208 VAC, 50/60 Hz, 30-39 Amps 1997 vintage.
KLA / TENCOR STARlight 301 is a sophisticated mask and wafer inspection equipment specifically designed to meet the stringent precision requirements of semiconductor manufacturers. This system includes an array of optical detection, real-time editing, review, defect analysis, and reporting tools that help ensure adherence to the tightest process controls. KLA STARlight 301 provides unparalleled accuracy and performance for the inspection of patterned substrates. Its advanced optical subsystem utilizes superior optical components and a high-resolution imaging unit that captures and digitally displays high-quality images of the samples. These images can then be accurately analyzed for the presence of defects, giving manufacturers confidence in achieving optimal yields. The machine's real-time editing capabilities allow users to inspect each area of the substrate on the fly. Advanced defect analysis tools can be used to identify and analyze any potential defects that may be present, such as crystal growth or adhesion issues. Reporting features make it easy to monitor and track in-process results, track defect levels, and report potential problems. TENCOR STARlight 301 is also capable of performing deep scanning, which is a process designed to detect defects that may be buried deep within a material or substrate. This can be particularly useful in the inspection of semiconductor wafers, where defects can be difficult to detect due to their size or position. STARlight 301 is easily scalable, with the ability to simultaneously inspect hundreds of wafers or several substrates in a single run. It is incredibly efficient, providing top-of-the-line throughput while still yielding accurate results. Additionally, the tool is backed with superior customer service and uncompromising reliability. In conclusion, KLA / TENCOR STARlight 301 provides superior imaging and analysis capabilities for the inspection of substrates and wafers. It provides accuracy, performance, and defect analysis tools necessary to meet the stringent requirements of semiconductor manufacturers. Its scalable, efficient design ensures fast throughput and reliable results, all supplemented by top-notch customer service and unrelenting quality assurance.
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