Used KLA / TENCOR Starlight SL3 UV #200296 for sale

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ID: 200296
Reticle inspection system Sparc Ultra 1 does not boot up Laser needs replacement Currently hooked up to facilities and shut down in a cleanroom.
KLA / TENCOR Starlight SL3 UV is a state-of-the-art mask and wafer inspection equipment that offers sub-20 nanometer resolution for advanced patterning applications. This system features a patented non-contact optical imaging technology that delivers high resolution imaging at its core. Utilizing an automated slide-stage for fast, efficient sample loading and positioning, the Starlight SL3 also boasts an intuitive user interface for easy sample observation. KLA Starlight SL3 UV is comprised of an advanced optics-based imaging unit with superior optics that are centered on a specially designed CCD camera. This camera uses advanced illumination techniques to achieve ultra-high resolution imaging. To achieve maximum image quality, the Starlight SL3 utilizes advanced pattern matching algorithms and advanced image processing algorithms, providing users with detailed defect analysis and rapid feedback. Additionally, the defect-detection capabilities include everything from regular masks to invisible defects on the printed circuit board. To ensure accurate results, the Starlight SL3 is equipped with a built-in calibrator module to ensure consistent imaging conditions. In addition to its powerful imaging capabilities, the Starlight SL3 is designed to provide maximum throughput. The machine is optimized for automation and runs advanced pattern recognition models to identify defects faster and more accurately than other systems. Furthermore, this tool has the ability to run multiple programs simultaneously to increase overall efficiency. Users can also save inspection settings across different job programs for efficient job management. Finally, the Starlight SL3 is designed for extreme safety and environmental protection. It features a completely automated "clean room only" process to eliminate environmental contamination, along with an automated particle-detection asset that looks for potentially damaging dust particles. Additionally, the model is designed to self-diagnose and alert users of any abnormalities and provide real-time diagnostics to minimize downtime. Overall, TENCOR Starlight SL3 UV is an advanced high-performance mask and wafer inspection equipment that delivers unmatched imaging capabilities, throughput, accuracy and safety in a single package. With its cutting-edge imaging capabilities and powerful processing power, Starlight SL3 UV makes high-tech patterning applications easier than ever before.
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