Used KLA / TENCOR Starlight SL3 UV #293815985 for sale

KLA / TENCOR Starlight SL3 UV
ID: 293815985
Reticle inspection system.
KLA / TENCOR Starlight SL3 UV is a powerful high-tech Wafer and Mask Inspection Equipment used for imaging and automated inspection of patterned substrate layers. It has a high-resolution imaging capability of 5 microns and an automated brightfield/darkfield inspection speed of up to 30 wafers per hour. KLA Starlight SL3 UV offers a suite of powerful image acquisition shuxploiting the maximum potential of charged coupled device (CCD) cameras and advanced illumination technologies. It includes simultaneous bright field and dark field imaging which is used to detect and measure small defects, imperfections, and non-uniformity in patterned layers. With its advanced imaging technology, the system creates a systematic overview of different layout layers and pattern structures, allowing users to quickly analyze and compare them. In terms of inspections capabilities, TENCOR Starlight SL3 UV offers advanced automated optical inspection (AOI) capabilities with automated Optical Probing (AOP). Through this AOP technology, users can define areas of the pattern with different levels of detail and resolution and then rapidly scan those areas for an in-depth analysis and comparison. The unit can also generate detailed mask reports with statistical analysis for further analysis. In terms of performance, Starlight SL3 UV is extremely reliable and offers an impressive range of features. Its advanced illumination technology ensures high contrast as well as uniform illumination for accurate and reliable results. With its high-speed scanning capabilities, the machine can quickly detect small defects and variations. Moreover, it offers a wide range of features including high-resolution imaging, automated dark field and bright field imaging, automated Optical Probing (AOP) technology and advanced statistical analysis. In conclusion, KLA / TENCOR Starlight SL3 UV provides the necessary tools and features to quickly inspect and compare pattern layers. Its advanced imaging and automation technologies enable users to detect and measure small defects, imperfections, and non-uniformity. Furthermore, its high-resolution imaging, advanced illumination, automated Optical Probing and detailed reports with statistical analysis ensure accurate and reliable results.
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