Used KLA / TENCOR Surfscan SP2 XP #9215848 for sale
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ID: 9215848
Wafer Size: 12"
Vintage: 2011
Particle measurement system, 12"
2011 vintage.
KLA / TENCOR Surfscan SP2 XP is a mask and wafer inspection equipment that uses advanced imaging algorithms to provide superior image quality and accuracy. It is designed to detect defects, contaminants, and other imperfections that are not easily detected by other mask and wafer inspection systems. It is designed to inspect both 300mm and 200mm diameter masks and wafers, enabling rapid and precise imaging capability. KLA Surfscan SP2 XP utilizes two light sources: a monochromatic xenon light source and a narrow spectrum mercury light source that enables the system to detect a broad range of defects, contaminants, and other unwanted defects. The unit can also detect defects in both bright and dark areas of the wafer or mask. Furthermore, the machine's resolution and signal-to-noise ratio can be adjusted to ensure higher precision imaging. TENCOR Surfscan SP2 XP has a highly efficient and well-designed optical tool. It includes two independent optical paths, one for the xenon light source and one for the mercury light source. The asset also features an advanced imaging processor and software allowing fast and efficient defect and particle detection. The model has a wide depth of focus, making it suitable for both large and small structures. Surfscan SP2 XP is equipped with a built-in vacuum chuck, which allows for easy and secure placement of the mask or wafer. It also offers a variety of image capture options, allowing for side-by-side comparison or full-field imaging, as well as the ability to define a region of interest. The equipment's flexibility and ease of use allows for quick and easy set-up and use. Additionally, its advanced software makes the system particularly efficient in automation. The unit is designed to integrate with existing imaging equipment in a manufacturing environment, allowing for a complete inline inspection process. KLA / TENCOR Surfscan SP2 XP provides outstanding performance and reliability with its advanced imaging algorithms, allowing it to detect a broad range of defects and defects, contaminants, and other unwanted features. Its advanced optical machine and image processor provides the highest levels of imaging quality, as well as the flexibility and ease of use to ensure efficient and accurate inspection. With its superior imaging capabilities, KLA Surfscan SP2 XP is an essential tool in ensuring the quality and reliability of mask and wafer products.
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