Used KLA / TENCOR Surfscan SP2 #293625532 for sale

KLA / TENCOR Surfscan SP2 is an advanced mask and wafer inspection equipment designed for semiconductor fabrication. This system is designed to inspect semiconductor semiconductor wafers, masks and photomasks with high accuracy and repeatability. KLA Surfscan SP2 unit is capable of detecting defects that are 100 nanometers in size with a spatial resolution of less than one nanometer. It is equipped with a 6-axis motion manipulator that enables the machine to inspect multiple points on the wafer simultaneously. TENCOR SURFSCAN SP 2 tool utilizes multiple image sensing technologies to detect defects in a variety of semiconductor masks and wafers. These technologies include brightfield imaging, darkfield imaging, and optical microscopy. Brightfield imaging is used for inspecting binary masks and wafers, while darkfield imaging is used for exposed features and fault isolation. Optical microscopy allows for defect inspection of patterned semiconductor wafers. The asset is also equipped with an integrated user interface that allows users to easily input probing parameters, select test parameters, and set the display range for different image types. The software is also capable of automatically adjusting test parameters for different images for more accurate results. In addition, the model includes a viewing mode that enables users to manually inspect suspicious regions of the wafer or mask. SURFSCAN SP 2 equipment utilizes a six-axis motion manipulator to accurately scan through multiple points of the wafer or mask quickly and efficiently. The system also allows users to take multiple measurements in a single scan. Additionally, the unit is designed to minimize cross-contamination between different samples due to its advanced air management machine. KLA SURFSCAN SP 2 tool is designed to be user friendly, providing users with an intuitive graphical user interface (GUI). The GUI allows users to easily review the captured images, set alarms, and monitor operational parameters. The asset also includes a number of built-in features that enable users to quickly and accurately analyze defects, including signature analysis and classification, fault isolation, and advanced defect analysis. Overall, KLA / TENCOR SURFSCAN SP 2 is an advanced mask and wafer inspection model designed for high accuracy and repeatability. The equipment utilizes a number of image sensing technologies to detect defects with a spatial resolution of less than one nanometer, as well as a 6-axis motion manipulator and an intuitive GUI for efficient scanning and data analysis.