Used KLA / TENCOR Surfscan SP2 #293759533 for sale
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ID: 293759533
Wafer Size: 12"
Vintage: 2010
Inspection system, 12"
EFEM
Carrier:
(3) Advantage SW CID, Phx, Shinko (Load port)
8 User-configurable LEDs to display the load port status
Load / Unload button for manual delivery hand-off
Cassette / Wafer mapping: FOUP and detect wafer
Empty slots and cross-slotted wafer
Chamber:
Powder coat panels kit: 8"-12"
Vacuum option optical filter
Load port vacuum: Tripple, 12"
FIMS Application:
Edge exclusion: 2 mm
Oblique incidence illumination (High / Standard / Low)
Normal incident illumination (High / Standard / Low)
Enhanced XY Coordinates
IDM SP2
PC:
Processer: Intel Xeon CPU 3.20 GHz
Handler: SecondaryUI, Phoenix, SP2
RAM Memory: 3.5 GB
DVD-ROM
Mouse
Keyboard
3.5" Floppy
Facilities:
CDA: > 28.3 Nl/min, > 6.6791 kg/cm2
VAC: > 28.317 l/min, >-700 mm Hg
Power supply: 208 VAC, 3 W-N
2010 vintage.
KLA / TENCOR Surfscan SP2 is a cutting-edge mask and wafer inspection equipment used in the semiconductor industry to detect defects and ensure the quality of photomasks and wafers during the manufacturing process. This innovative system combines advanced technology with high precision to provide thorough inspection capabilities, enabling semiconductor manufacturers to maintain high-yield production and meet stringent quality standards. At the core of KLA Surfscan SP2 unit is its sophisticated imaging technology, which utilizes advanced optics and sensors to capture high-resolution images of the surfaces of masks and wafers. These images are then analyzed using powerful algorithms and software to detect and classify various types of defects, including particles, pattern deviations, and other anomalies that can impact the performance and reliability of semiconductor devices. One of the key features of TENCOR SURFSCAN SP 2 is its ability to inspect masks and wafers at a microscopic level, ensuring that even the smallest defects are identified and classified accurately. This level of precision is crucial in the semiconductor industry, where the size and density of circuit patterns continue to shrink, making it increasingly challenging to detect defects with traditional inspection methods. SURFSCAN SP 2 is equipped with multiple inspection modes, allowing users to customize the inspection process based on the specific requirements of their manufacturing processes. These modes include brightfield, darkfield, and hybrid imaging modes, each offering unique capabilities for detecting different types of defects and optimizing inspection performance. Furthermore, Surfscan SP2 features a user-friendly interface that enables operators to set up and run inspections efficiently, streamlining the inspection process and minimizing downtime in production. The machine also offers automated defect review and classification capabilities, allowing users to quickly identify and analyze defects without manual intervention, further improving productivity and yield. In addition to defect detection, TENCOR Surfscan SP2 can also perform critical dimension measurements, providing valuable data on the size and shape of features on masks and wafers. This information is essential for ensuring the accuracy of semiconductor devices and maintaining process control in manufacturing. Overall, KLA / TENCOR SURFSCAN SP 2 is a state-of-the-art mask and wafer inspection tool that offers unparalleled capabilities for detecting defects, ensuring the quality of semiconductor devices, and enhancing production efficiency in the semiconductor industry. Its advanced imaging technology, multiple inspection modes, and user-friendly interface make it a powerful tool for semiconductor manufacturers striving to achieve high yield and reliability in their processes.
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