Used KLA / TENCOR Surfscan SP2 #9240763 for sale
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ID: 9240763
Wafer Size: 12"
Particle measurement system, 12"
Operating system: Windows XP SP3
Carrier:
Phx, SHINKO (Load port)
(8) User-configurable LEDs to display load port status
Load / Unload button for manual delivery hand-off
Cassette / Wafer mapping
Chamber:
Powder coat panels kit
Vacuum option: 200/300mm
Load port vacuum: 12" Dual FIMS
Hardware:
5-Color light tower (RBYGW)
Ethernet
E84 Enabled for OHT and AGV/RGV
GEM/SECS and HSMS
Handler secondary UI, Phoenix, SP2
Main computer:
Intel®Xeon™ CPU 3.20 GHz
Memory: 3.5 GB RAM
DVD- ROM
Mouse
Keyboard
Floppy, 3.5"
FEC Computer:
Intel®Pentium®4 CPU
512 MB RAM Memory
Applications:
Oblique incidence illumination (High / Standard / Low)
Normal incidence illumination (High / Standard / Low)
Enhanced XY coordinates
Standard classification package
LPD-N Classification
LPD-ES Classification
High sensitivity inspect mode
High throughput inspect mode
Options:
Haze
IC / OEM Mfg surf quality recipe
Facilities:
Power: 208 VAC, 3 W-N
CDA: >28.3 Nl/min, >6.6791 kg/cm²
Vac: >28.317 l/min, >-700 mm Hg.
KLA / TENCOR Surfscan SP2 is a mask and wafer inspection equipment that is used to detect and correct unwanted defects on both masks and wafers. KLA Surfscan SP2 uses optical, electrical, and mechanical components to detect and correct defects on a variety of wafer types. The optical inspection includes both bright field and dark field imaging to accurately detect any defects. The electrical features utilize contact and non-contact methods to measure electrical properties such as resistance, capacitance, and current. The mechanical features allow TENCOR SURFSCAN SP 2 to change direction for precise movements and adjustments while inspecting the wafer. KLA / TENCOR SURFSCAN SP 2 has integrated techniques such as focus variation and image processing to inspect the wafer and identify and locate potential defects. Focus variation provides a three-dimensional view of the wafer, allowing the system to accurately detect sub-micron defects. The imaging subsystem uses an accurate and high-resolution CCD camera to capture images of the wafer for further analysis. KLA SURFSCAN SP 2 also has advanced software that is used to analyze the data from each inspection and display the results in an easy to read format. The software has a series of tools that allow users to filter and identify the specific defects that are present on the wafer. The unit also has a built-in auto-scheduling feature that can be used to set up regular inspections for different wafer types and runs. In addition, Surfscan SP2 is designed with convenience and safety in mind. It is equipped with an automated machine that is easy to set up and use. The tool is highly customizable, allowing users to adjust the parameters according to their specific requirements. The asset is also equipped with several safety features, such as a key lock and emergency stop switch, to ensure a safe operating environment. Overall, TENCOR Surfscan SP2 is a versatile model designed to inspect wafers and detect and correct any unwanted defects. Equipped with optical, electrical, and mechanical components, the equipment is able to precisely detect sub-micron defects on a variety of wafer types. The advanced software also allows users to filter and analyze the data to quickly identify defects. With its automated features and safety features, SURFSCAN SP 2 provides an efficient and secure mask and wafer inspection system.
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