Used KLA / TENCOR Surfscan SP2 #9308728 for sale

KLA / TENCOR Surfscan SP2 Mask and Wafer Inspection Equipment is a high-performance, cost-effective solution for inspecting masks and wafers in the semiconductor fabrication process. Featuring market-leading image acquisition and inspection algorithms, KLA Surfscan SP2 ensures the accuracy and quality of your products. With a full suite of advanced integrated tools, TENCOR SURFSCAN SP 2 supports die-to-database measurements, yield analysis, layout review, and defect analysis. The system includes a large, high-resolution area scan sensor with dual light sources, a distributed object architecture, automatic feature recognition, expert user-created inspection systems, defect classification, and intelligent defect printing. KLA SURFSCAN SP 2's distributed object architecture makes it easy to configure complex unit parameters, manage communications with associated equipment, and extend machine capabilities to include third-party components. Automatic feature recognition is enabled by the built-in template-matching engine, which can identify critical features and then conduct inspections for correct feature placement, orientation, starburst parameters, and structural analysis. Expert user-created inspection systems provide fast, consistent, and reliable process monitoring. KLA / TENCOR SURFSCAN SP 2 also provides a comprehensive defect classification hierarchy with hierarchical statistical libraries, linking defects on non-intrinsic features such as deposited residues or particles with the source defects upstream. The tool's automated wafer mapping and image playback features facilitate efficient in-line or post-process analysis and isolation of defects of interest. Intelligent defect printing makes it possible to obtain high-contrast defect images on a variety of inkjet and laser printer media. Additional features, such as image stabilization, automatic edge detection, image stacking, smart zoom, and image overlay, provide increased asset capabilities and maximized inspection accuracy. Surfscan SP2 also provides process management reporting in a wide variety of environments including Windows, Linux, UNIX, and Sun Solaris operating systems. Overall, SURFSCAN SP 2 Mask and Wafer Inspection Model is a highly reliable and cost-effective solution for patterned thin film research production applications. With its advanced integrated tools, expert user-created inspection systems, flawless image accuracy, and in-line or post-process analysis, TENCOR Surfscan SP2 is a truly powerful solution for any patterned thin films manufacturing process.