Used KLA / TENCOR Surfscan SP3 #293594322 for sale
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ID: 293594322
Wafer Size: 12"
Vintage: 2014
Wafer surface inspection system, 12"
Heat exhaust blower
(2) Oblique incidents
(2) ST Modes
(2) Edge exclusion area: 2 mm
Handling options: (2) Vacuum chuck triple FIMS handlers (3 x 300 mm)
(2) Dual scans: Normal and oblique
(2) SURF monitor
(2) Fluorescence optical filter
(2) Spatial filters: 20°, 40°
(2) Environmental optics kits (COE)
(2) Cool white panels
2014 vintage.
KLA / TENCOR Surfscan SP3 is an advanced mask and wafer inspection equipment designed to provide high-resolution, high-speed semiconductor defect detection and classification. The system is based on KLA patented reflective imaging technology and is tailored to the exacting demands of semiconductor production. The SP3's powerful silicon wafer and flat panel mask inspection capabilities enable wafer steppers and pattern generators to produce products of ultimate quality and reliability. The unit provides advanced inspection of masks and wafers with unparalleled sensitivity, accuracy, and flexibility. KLA Surfscan SP3 combines powerful image acquisition, image processing, and defect classification capabilities. The machine features an array of advanced image acquisition techniques, such as Quad and Reduction Variations, that enable high defect resolution and advanced surface imaging. TENCOR Surfscan SP3 also features high-resolution optics, high pixel density and no dead zones thanks to the uniform pixel position. Surfscan SP3 also features a number of powerful detection algorithms and interactive analysis tools. The advanced algorithms enable precise analysis, while the interactive toolset allows users to quickly modify, customize and verify inspection results. KLA / TENCOR Surfscan SP3 is designed to support multiple user configurations, including single-user setups and larger multi-user networks. The tool can also be integrated with other systems for enhanced efficiency and productivity. KLA Surfscan SP3 is equipped with a number of advanced wafer control capabilities that further enable high-end performance. The asset includes precise stage and translating half-reticle adjustment for precise measurements and alignment, as well as an advanced batch progress report for enhanced control over quality assurance. The model also includes automated pattern matching for high-speed repeatability, automatic deformation correction for improved wafer flatness, and a dedicated laser source for superior repeatability and cost-efficiency. Finally, TENCOR Surfscan SP3 features a web-based GUI that allows users to easily control their inspection sequence and view results. The GUI also provides users with unprecedented access to equipment features, settings, and reports. The robust reporting suite enables users to quickly access information and insights on system performance, making Surfscan SP3 a powerful and efficient tool for mask and wafer inspection.
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