Used KLA / TENCOR Teron 610 #9291368 for sale

KLA / TENCOR Teron 610 is an automated mask and wafer inspection equipment, designed to meet the stringent industry requirements for advanced inspection and review of photomasks and wafers. The system utilizes two high resolution ASML 5500 imaging and projection systems, and a bright field imaging module, to capture high-resolution images of the mask or wafer, and to project the imaging onto the substrate for a high-precision analysis. KLA Teron 610's automated optical inspection (AOI) capabilities give it the ability to detect defects, including line breaks, width variation, and missing shapes, as small as 40nm. The image data can be stored directly on an FTP server, making it easy to transfer for reports, and integrate the unit's data with other quality assurance systems. TENCOR Teron 610 is also equipped with automatic defect review (ADR) capabilities, which enable users to classify, mark, and save defects quickly. In addition, the machine can detect backside pattern-shift defects, enabling users to identify any non-conforming patterns on the backside of the substrate. The tool has two video microscope stations, enabling up to eight images to be captured for detailed analysis of a given pattern. The asset also offers advanced pattern recognition, allowing it to detect subtle defects that other systems would miss. It utilizes high-resolution imaging to capture microscopic details that were once beyond the resolution of automatic optical and defect inspection systems. Finally, Teron 610 utilizes a dynamic defect filter, allowing users to focus their inspection efforts on specific types of defects. Overall, the combination of these features makes KLA / TENCOR Teron 610 a powerful and highly advanced mask and wafer inspection model. Its high resolution imaging and automated inspection capabilities enable it to detect defects as small as 40nm, and its advanced pattern recognition and defect filter features make it an ideal equipment for ensuring the accuracy of the most demanding photomasks and wafers.