Used KLA / TENCOR Teron 610 #9378999 for sale

KLA / TENCOR Teron 610 is a mask and wafer inspection equipment which is designed to provide precision defect detection and analysis of advanced photomask patterns and wafers. It utilizes a proprietary architecture to achieve highly sensitive edge and pattern defect detection, independent of tolerances, process parameters and geometry. The system utilizes advanced optics and scintillation radiation source, providing high sensitivity for 0.35 micron imaging resolution. A number of imaging modes, such as field aligning, rapid scanning and shading correction enable increased process uniformity and improved pattern fidelity in different types of masks and wafers. Additionally, KLA Teron 610 also uses a unique laser scanning technique for defect profile optimization and wafer pattern recognition. TENCOR Teron 610 inspects a variety of photomask and wafer notes with at least 0. 250 micron pitch. The maximum area inspection per wafer is 12 inches in diameter, while the maximum usable area for masks is 28 inches. Throughput of the unit is optimised through its automated mask and wafer handling machine. Teron 610 also provides an extensive suite of proffessional CAD tools, stage inspection, 3-dimensional image analysis and defect review algorithms, along with geometrical inspection algorithms for detecting misaligned pins, bridges and other subtle defects. The user interface of KLA / TENCOR Teron 610 is designed to be intuitive, enabling easy setup, efficient operation and batch processing. The interactive user interface also offers sophisticated features such as defect review, statistics calculation and reporting, as well as comparison of inspection results. The tool also comes with automated review and pattern recognition modules, which aid in the identification of recurring defects from one wafer to the next. For increased data security, KLA Teron 610 features an optional network interface, which allows operators to control the operation of the asset remotely. The model also supports a number of third party wafer handling systems. It is a cost effective and reliable inspection equipment for any environment requiring the detection and analysis of photomask patterns and wafers.