Used KLA / TENCOR UVision 5 #9300220 for sale

KLA / TENCOR UVision 5 is a leading-edge mask and wafer inspection tool used in the semiconductor manufacturing process. It uses a combination of UV, optical, and nuclear radiation sources to identify defects in the layers of the masks and wafers. This high-resolution tool is designed to detect defects at a smaller level than human eyes can distinguish, thus ensuring the highest level of quality assurance is achieved in the production process. The equipment features a robust platform that offers reliable and accurate results. In-plane and out-of-plane optical metrology systems are used to detect deep subsurface defects and other patterns in the structures of the masks or in the thin films of the wafers. These images are then analyzed through a number of image processing tools that use UV, optical, and nuclear radiation sources to identify the defects. KLA UVision 5 is uses advanced microscopy and image processing algorithms to enable in-depth analysis of samples such as feed-throughs, etch-throughs, and via defects. The system accurately monitors layer spacing, withstands particle stress, and aids in defect qualification. Additionally, TENCOR UVision 5 includes a no-light function for inspecting photoresist mask openings—which often appear too small or nonexistent—while in the dark. The unit is also powerful enough to handle 3D semiconductor inspection, allowing for better in-depth inspection and analysis of patterns that require multiple viewing angles. This helps to ensure that the manufacturing process is as optimized and efficient as possible. The combination of the powerful detection capability and the high-precision image processing tools makes UVision 5 a powerful and reliable mask and wafer inspection machine for semiconductor production. Its advanced algorithms are able to identify and categorize defects quickly and accurately, so that problems can be addressed promptly and quality production can be maintained.