Used KLEO LDI CM 20 #9246262 for sale

KLEO LDI CM 20 is an advanced mask and wafer inspection equipment designed to identify non-conforming marks on patterns used in lithography which may result in yield-loss. The system is comprised of a digital imaging subsystem, a light-diffraction subsystem, and a data management subsystem. The digital imaging subsystem utilizes a charge-coupled device (CCD) to scan sample surfaces with high sensitivity and dynamic range. The image is then captured and analyzed using sophisticated software. The software has the capability to detect, identify, and measure defects, discs and grains. The unit also incorporates a bright light source with a stable output to optimize contrast between dark and light regions on the scanned surface. The light-diffraction subsystem provides multiple angles of diffraction light scan to assess surface characteristics. The light source is movable to measure various surface configurations and angle of incidence. The data acquired from this subsystem is analyzed to identify a range of non-conforming elements that may lead to yield-loss. The data management subsystem allows users to access the scan results from the digital imaging and light-diffraction subsystems. Features such as real-time monitoring and adjustment of the scan parameters enable users to ensure quality with every sample. All collected data is stored and organized in a database for efficient recall and analysis. Overall, LDI CM 20 mask and wafer inspection machine is able to provide fast, accurate, and reliable evaluation of lithography patterns. The highly automated tool allows users to find and reduce yield-loss elements quickly and cost effectively, thereby ensuring compliance and overall quality.