Used KOBELCO / LEO EPM #293642530 for sale

KOBELCO / LEO EPM is a state-of-the-art mask and wafer inspection equipment used in semiconductor fabrication plants. This system provides an end-to-end inspection solution that verifies mask and wafer integrity at every stage of production, helping to reduce yield loss due to defects. The unit uses high-resolution imaging, photomask evaluation and automated inspection to achieve rapid and accurate measurements of geometry and defects. This enables quick identification of device- to-wafer variations, enabling rapid adaptation of production process and improved product quality. The machine can also detect defects during exposure of the photomask and during wafer etching. The tool incorporates a variety of innovative technologies such as an advanced laser and charged particle imaging asset. This model increases the accuracy and resolution of photomask and wafer inspections by as much as 100 fold compared to traditional optical microscopy. The charged particle imaging equipment also provides superior accuracy in identifying and locating defects, enabling earlier and more cost effective detection. LEO EPM also features an automated imaging system for creating high-resolution images of photomasks and wafers. This unit performs image processing to compare the images with stored data, providing fast, reliable results. It can also output various types of graphical data and written reports. Overall, the machine has been designed to provide a comprehensive and effective approach to mask and wafer inspection, helping to reduce yield loss due to defective products. The tool's high resolution imaging and automated processes also ensures faster and more accurate inspection, allowing manufacturers to make timely adjustments to their production processes. With KOBELCO EPM, manufacturers can reduce the risks associated with their semiconductor fabrication operations and provide better quality products to their customers.