Used KRAUTKRAMER USK-7 #293667698 for sale

KRAUTKRAMER USK-7 is a powerful and technologically advanced mask and wafer inspection equipment used in semiconductor manufacturing processes. It offers an array of advanced features and capabilities to analyze and inspect masks and wafers used in a variety of semiconductor fabrication processes. The system utilizes high-resolution microscope station and automatic image processing of different types of photo-masks, such as printable, optical, and electron beam (EB) masks. Its software is capable of detecting defects on critical dimensions such as line width, area and open/short defects for chip acceptance. In addition, it can also inspect various semiconductor patterns and provide detailed classification and analysis of various fault types, such as mask related faults, metrology related faults, yield related faults, etc. USK-7 is designed with advanced automated operation capabilities to ensure reliable, high-speed inspection and quality analysis. Its easy-to-use graphical user interface (GUI) provides users with an intuitive interface and offers convenient defect review and reporting functions. The unit offers various illumination configurations, such as ring light, dark field and polarized light, to ensure optimal defect detection. Additionally, its ultra-violet (UV) optics provide higher contrast and resolution. The machine also includes various automated functions such as wafer-in/wafer-out automation, track-and-trace of wafers, alignment workflow, full field and differential comparison, and prescription mask inspection for deep trenches, high aspect ratio features and electro-plated copper lines. Its patented inspection recipes provide high resolution, automatic mask recognition and fast defect detection. Furthermore, its precision optics and motion-driven control unit combine to ensure reliable and detailed inspection, allowing for easy throughput and reduced cycle times in the process. Altogether, KRAUTKRAMER USK-7 is a highly reliable and advanced mask and wafer inspection tool designed to meet the most demanding requirements of mask and wafer inspection in semiconductor fabrication. Its advanced features and capabilities offer unparalleled levels of reliability and accuracy in the inspection, classification and analysis of masks and wafers, helping to ensure reliable performance of fabrication processes.