Used KRAUTKRAMER USK-7B #293667707 for sale

KRAUTKRAMER USK-7B is a mask and wafer inspection equipment designed for production testing of 200mm-450mm diameter wafer and masks. It utilizes a high-resolution imaging system and a high-speed image processing unit to provide reliable test results of defects and irregularities found on the mask and wafer surfaces. USK-7B machine has a field of view of 710 x 710mm and a maximum image resolution of 1024 x 1024 pixels. It features a high sensitivity fourth-generation CCD image sensor with an adjustable exposure time to capture both the fine and coarse defects on the surfaces of the wafer and mask. The image processing tool uses a high-speed digital signal processor (DSP) to analyze the images taken, compare them to the reference images, and detect any irregularities or defects on the surfaces of the mask and wafe. KRAUTKRAMER USK-7B is equipped with a bright LED ring illuminator, which provides a uniform illumination across the mask and wafer surface, allowing for clear and precise inspection of the mask and wafer. Its powerful optical asset, which includes a large objective lens, allows for the imaging of many different kinds of defects, including micro-defects and sticky defects on the wafer and mask surfaces. The model's sophisticated pattern recognition technology enables the analysis of the defect distribution, helping to identify potential process issues. USK-7B also features an optional Thick Film measurement unit, which is capable of measuring the height of thick films on the wafer and mask (thick films of greater than 10 microns). This helps identify any potential issues with the lithography process prior to volume production. In addition to its high-sensitivity imaging and processing capabilities, KRAUTKRAMER USK-7B also includes a user-friendly interface, allowing for easy operation and control. Generated reports can be exported in a variety of formats and saved for historical reference, making USK-7B an ideal tool for quality control in semiconductor production.