Used KURODA Nanometro 450TT #293645313 for sale

KURODA Nanometro 450TT is a highly advanced mask and wafer inspection equipment that integrates ultra-high resolution imaging and measurement with both visible and infrared light. It is designed to thoroughly inspect and analyze the patterns, shapes, and defects of masks and wafers necessary for the manufacture of semiconductor devices. Nanometro 450TT utilizes a combination of advanced optics, advanced metrology and image acquisition technologies, and software analysis programs, to provide high resolution imaging and measurement capabilities. The imaging system included in the unit is capable of providing up to 265 megapixel resolution images, providing unparalleled detail for even the smallest defects and geometrical features in the masks and wafers. Utilizing these technologies, KURODA Nanometro 450TT is capable of conducting a wide range of testing and analysis, including surface defect inspection, pattern registration inspection, overlay measurement, reticle registration inspection, and composition analysis. In terms of surface defect inspection, Nanometro 450TT is capable of detecting even the smallest defects and impurities on the masks and wafers. The machine can measure a minimum line and space of 0.07 micron, allowing it to detect even the tiniest defects and shapes with utmost accuracy. Additionally, the tool is capable of detecting and measuring displacement and displacement angle with measurements down to 0.1 Angstrom, allowing for extremely precise analysis of geometrical features. Finally, the asset can also provide comprehensive material analysis, by measuring full area kinematic properties, particle analysis, surface roughness and humidity, and positive and negative material stress. For pattern registration inspection, KURODA Nanometro 450TT is capable of measuring and detecting patterns with 1000 micro-lines per second, utilizing a neural network for pattern recognition. The model can also measure overlay offsets with accuracy down to 1 nanometer, enabling spectroscopic overlay analysis. Additionally, the equipment can measure the angle of masks and wafers, down to 1 milli-radian, allowing for highly precise positioning. Finally, Nanometro 450TT also features an intuitive and user-friendly graphical user interface, allowing for easy and intuitive operation of the system. Additionally, the unit can be remotely controlled, allowing for maximum flexibility and convenience. In conclusion, KURODA Nanometro 450TT is a highly advanced mask and wafer inspection machine, capable of providing unparalleled levels of resolution and accuracy. The tool utilizes a combination of advanced optical, metrology, and image acquisition technologies, and sophisticated software analysis programs, to enable comprehensive and highly precise inspection and analysis of masks and wafers. Additionally, the user-friendly graphical user interface makes the asset easy and intuitive to operate, providing maximum convenience and flexibility.