Used LASERTEC 7MD 62S #293652019 for sale
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ID: 293652019
Automatic mask inspection system
STEAG / HAMATECH 210079 9110000 ASE GmbH Machine
KARL SUSS / MICROTEC Lithography G Ionisation unit
PANASONIC VP-5565A Oscilloscope, 50 MHz
USHIO UIS-2511DE88
OJIDEN OFL-TV-S5 Foot switch
(2) PANASONIC VQ-054R31 Probes
Controlled power processor
Controller keyboard
Automatic photomask / Reticle inspection system
Photomask defect detector
ST-Cam cable
Counter port
PIO Port cable
CPU: Intel Pentium 4 3.4Ghz / 1 GB RAM
DIF DD (TL) Card
SLCE (TL) Card
LIMAD(TD) Card
DIF DM Card
DIF DC (PSL) Card
SLCE (PSL) Card
LIMAD (AF) Card
DIF DG Card
(3) AD DG Cards
AMTX Card
DIF DD (TR) Card
SLCE (TR) Card
(5) DMTX Cards
DIF DJ Card
SLCE (HVC) Card
LIM AD (RD) Card
DIF DC (PSR) Card
SLCE (PSR) Card
F DET Card
POSI COMP Card
SL CONT Card
DEF MIX Card
SYNC Card.
LASERTEC 7MD 62S Mask & Wafer Inspection Equipment is an advanced automated mask and wafer inspection system designed to provide high-precision inspection of masks and wafers used in the semiconductor manufacturing process. The state-of-the-art unit offers uncompromising high-resolution imaging and 100X magnification with full-field inspection to aid the identification of defects. The machine supports a wide range of substrates such as front-side and back-side wafers, plus wafer measurements, lithography-based alignment, PET, B- or D-side mask inspection and modules for high-end mask applications for advanced node devices. Substrates measuring up to 8" can be inspected by the tool, with an additional expanded field option to accommodate 12" substrates. The asset utilizes a high-resolution 20 megapixel camera and high-speed 14 fps linear scanning technology to meet the most stringent requirements of the most demanding applications. It is capable of sub-micron resolution along with up to 6 inspection algorithms to provide maximum process control for applications such as Contamination analysis, Line edge analysis, Overlay analysis, ALD film thickness control and ALD residual film control. The model also offers a variety of image analysis modes including optical defect inspection, line edge/width measurements, scatterometry and overlay measurements. The comprehensive comprehensive software package provides comprehensive data handling, inspection process control and defect classification and assessment to ensure the highest levels of process control and quality control. For increased reliability and process stability, the equipment has a proprietary dynamic pattern-matching technology offering precise pattern recognition and drift control. It also features on board water management technology for optimization of the water by-products generated during the photo etching process, as well as a high-end beam monitor to ensure stability in the electron optics. LASERTEC 7MD62S Mask & Wafer Inspection System offers a comprehensive tool set designed to provide precise and automated inspection and analysis. With its sophisticated hardware and software solutions, the unit is an ideal tool for ensuring maximum process stability, repeatability and quality assurance during the design and manufacture of semiconductor devices.
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