Used LASERTEC M8351 #9228093 for sale

LASERTEC M8351 is a mask and wafer inspection equipment designed to detect physical defects on critical photomask and reticle substrates. The system is capable of imaging and analyzing defects down to 140 nm (Nanometer) in size and offers a wide range of image analysis and defect characterisation capabilities to improve product quality and yields. LASERTEC M 8351 provides sub-micron resolution and fast inspection times using an enhanced laser error scanning technique (ELT) along with advanced focusing technologies for high-speed image capture and defect analysis. Using ELT, the unit can quickly identify defects, pattern misalignments and colour variations in substrates much larger than the optical field of view (FOV). The machine offers various imaging modes, such as dark-field imaging, low-angle scanning and high-dynamic range imaging. This allows users to analyze various types of defects in each field of view to maximize inspection accuracy and efficiency. M8351 also utilizes an intuitive user-friendly interface that enables users to quickly adjust settings for the operation mode and image capture. Users can also easily upload or download images on the tool for further analysis and reporting. M 8351 is an automated asset with built-in automation tools, enabling simplified operation through sample setup and automatic exposure control. It also supports various software packages, such as DPAST, PROFILER, OVI, NDT and OES. LASERTEC M8351 provides comprehensive, automated and manual image analysis and mask analysis diagnostics. The model also provides users with a real-time defect analysis and statistics display. It allows users to leverage the equipment's defect detection capabilities to correlate, analyze and identify failures between multiple levels of the process hierarchy. LASERTEC M 8351 is also equipped with an intuitive and ergonomic design which enables quick and easy operation. It provides a professional, high-precision lens system and optic navigator to deliver an outstanding image resolution. The unit also supports a variety of high resolution cameras, offering a wide range of image formats and resolutions designed specifically for an imaging application. In conclusion, M8351 is an advanced, scalable and ergonomic mask and wafer inspection machine that offers accurate and robust imaging and analysis capabilities. This tool is specifically designed to detect and identify defects on critical photomask and reticle substrates down to 140 nanometers in size. The features of the asset make it a great choice for industrial and commercial applications demanding precision and accuracy.