Used LASERTEC PEGSIS P100 #9140823 for sale

LASERTEC PEGSIS P100 is a mask and wafer inspection system designed for research and development of advanced photolithography processes. It provides the requisite defect detection and classification capabilities, combining both spinner-based surface scanning technologies and image-based methods. The analytical capabilities of the P100 enable finer evaluations of the size, position, and other features of each defect, providing rapid assessment and troubleshooting of any issues that may arise in the design process. The P100 is equipped with advanced 4-way x-ray scanning capabilities, a dedicated pattern recognition system, and sophisticated design comparison algorithms. The 4-way x-ray scanning enables the purposeful identification of topographically complex features and fine in-depth or abnormal defects. This scanning system allows for the accurate measurement and analysis of these features, providing the necessary quantitative data for the further quantitative assessment of different aspects of the mask and wafer structure and composition. The P100 is also designed with pattern recognition and comparison systems for automatic detection of common mask and wafer defects. These systems are specifically designed to provide fast and efficient defect identification and to predict and anticipate changes in wafer and mask structure. The pattern recognition systems are also capable of performing image similarity analysis, which helps to identify and corroborate similar defects that may be related to an engineering design. The image similarity analysis is further complemented by the feature-based design comparison algorithms of the P100 which enable comprehensive evaluation of different aspects of the structure of the mask and wafer. By comparing different designs, the P100 is equipped to identify the similarities and differences between them, and produce correlations between the design process and any mask or wafer anomalies. PEGSIS P100 is thus designed to provide advanced mask and wafer inspection capabilities with the ability to quickly detect and classify defects. With the combination of its X-ray scanning, pattern recognition, and design comparison algorithms, the P100 provides powerful and versatile analytical insights that can be used to rapidly troubleshoot and optimize any design process.