Used LEICA APECS 3020 #9410740 for sale

LEICA APECS 3020 is a high performance mask and wafer inspection equipment designed to meet the rigorous demands of the semiconductor industry. This system eliminates manual errors by providing a series of automated methods for inspecting masks and wafers quickly and accurately. The unit is capable of inspecting lithographic masks up to 6" in diameter and 1.0um in feature size and provides a superior 3D analysis capability with its advanced imaging technology. APECS 3020 utilizes advanced automated optical inspection (AOI) technology to quickly and accurately inspect mask and wafer patterns. The AOI uses digital image acquisition to acquire imaging data from the mask surface and then processes that data to generate a digital image. This image is then analyzed and compared to a pre-defined set of criteria to detect and identify potential mask defects or irregularities. The machine is equipped with a high precision stage and advanced software algorithms to ensure precise and accurate wafer inspections. The high-resolution stage allows the accurate detection of small features on the wafer surface while the advanced software algorithms help ensure precise and accurate position measurements of features on the mask surface. LEICA APECS 3020 also features intuitive controls and an easy-to-use user interface for intuitive operation and precise control over mask and wafer inspection processes. All tool controls are accessible via a touch screen and an ergonomic keypad. The asset also offers a variety of data storage formats such as TIFF, JPEG, RAW, GIF, and BMP for saving analysis results. APECS 3020 is equipped with a variety of advanced features to ensure the best possible results in the shortest possible time. These features include high-speed scanning, built-in defect repair, automatic focus control, advanced image processing and data analysis capabilities, pixel-wise mask inspection, automated defect correction and automatic reporting capabilities. These features, combined with its advanced mask and wafer inspection technology, provide unsurpassed accuracy, reliability, and speed. In conclusion, LEICA APECS 3020 is a powerful mask and wafer inspection model designed to meet the stringent demands of the semiconductor industry. This equipment comes with advanced optics, intuitive system controls, and a variety of automation and analysis features, allowing for quick and accurate analysis of masks and wafers. APECS 3020 can help ensure the highest level of quality and reliability for all semiconductor devices.