Used LEICA INS 2000 #293626746 for sale

LEICA INS 2000 is a mask and wafer inspection equipment from LEICA Microsystems. Designed to maximize throughput and identify the smallest of flaws on the most complicated mask-down litho system up to 1X, 2X and 5X reticles, the hands-free unit is ideal for expedited inspection of critical front side and back side mask defects. INS 2000 includes advanced kinematics and diagnostics that are essential to ensure precision alignment of the mask and wafer or film. With autonomous setting, parallel detection and wafer measurement, the machine eliminates operator errors and eliminates time wasted on manual alignment. This ensures highest quality results at the fastest possible speeds. LEICA INS 2000 inspects mask and wafer surfaces with the highest resolution, using a patented optical method called 'Confocal Imaging'. This method relies on an imaging technique based on the interaction between a low-power laser light source and the surface of the mask or wafer. The tool captures high resolution images of the surface structures with sub-micron resolution. INS 2000 is equipped with automatic defect tracking software to further reduce human labor and enable more accurate and reliable results. The asset also features defect classification and prioritization options, which streamline the process by grouping detected defects according to size and feature attributes. This ensures a more efficient production process and helps reduce costs. LEICA INS 2000 also features a modular design enabling the model to be easily adapted as production needs change. Combined with its high speed, accuracy and repeatability, this feature makes it ideal for high throughput inspection processes. INS 2000 is an advanced mask and wafer inspection equipment that incorporates the latest technology and imaging techniques to identify an accurate surface topography. This system enables the fast and efficient inspection of mask and wafer surfaces, which is essential in delivering consistent and reliable end-products. With its modular design and patented optics, LEICA INS 2000 is an unsurpassed solution for masking and wafer inspection systems.