Used LEICA INS 2000 #293680723 for sale

LEICA INS 2000 is an advanced imaging technology for mask and wafer inspection. This instrument provides high-resolution imaging of masks and wafers at the nanometer level, allowing users to accurately inspect and measure complex features. INS 2000 has 2 side-by-side stereo heads offering an 8-megapixel image per head. The instrument displays the images on a high-contrast LCD monitor, and utilizes sophisticated software tools for image processing and analysis. LEICA INS 2000 offers precise, advanced imaging capabilities with up to 0.35 µm imaging resolution, automated image stitching and merging, and proprietary nanofocusing maximum image contrast. The imaging is achieved with a high-resolution laser interferometer and a precise Z-axis stage system combined with a patent-pending pixel-level registration optics. Automated image stitching and merging allows for scanning large substrates with just one scan. These features provide the best possible image for mask and wafer inspection. For mask inspection, INS 2000 is capable of examining high-resolution, complex patterns with minimum overlay mismatching. This eliminates the need for physical microscopy, which can be time consuming and labor intensive. A unique pattern recognition tool with sophisticated algorithms can identify pattern defects and rapidly identify inconsistent processes. Additionally, the automated image stitching and merging allows users to accurately measure registration and overlay deviations. This tool supports 1D and 2D parametric analysis with an optional focus retrieval option for optimal image contrast. LEICA INS 2000 is a valuable tool for wafer inspection. It can quickly scan the entire wafer at high resolution to detect particle contaminants. It also gives users the capability to quickly identify and quantify defects on the wafer surface, such as scratches, chips, and etch-related defects. Additionally, it uses a patented technology to detect metal leaks, voids, and other contaminants. These features allow users to get a full picture of the wafer in minutes, saving time and money. INS 2000 is a powerful instrument for mask and wafer inspection. It offers high-resolution imaging and automated image stitching and merging, which allows users to quickly and accurately inspect their samples. Its sophisticated imaging tools ensure optimal image contrast and parametric analysis, while its advanced particle detection algorithms allow users to quickly identify and quantify defects. LEICA INS 2000 is an invaluable tool for any application requiring precision imaging and analysis.