Used LEICA INS 2000 #9378304 for sale

LEICA INS 2000 is a mask and wafer inspection equipment designed to reduce time to market and increase yields. It includes an automated optical inspection system (AOI) which is capable of inspecting all layers of the mask in conjunction with several features. The unit features an automatic alignment process, which uses an advanced high-resolution digital camera to precisely align lithography masks, both on mask and wafer level, for accurate and repeatable alignment performance. This ensures consistent inspection results for all layers of the mask. The machine also offers a rigorous and comprehensive set of smart defect detection algorithms which can detect a variety of mask defects, from particle defects and wafers to edge defects, bridges and clipping. These algorithms are capable of detecting and flagging any defects missed by the lithography process. This ensures that users can quickly identify, assess and address such defects before releasing their masks for manufacture. In addition, INS 2000 has the capability to analyze defects across multiple masks in a single run, allowing users to quickly identify potential shortcomings in their masks. The tool also incorporates a 3D rendering capability, which provides a more detailed microscopic perspective of mask and wafer defects, allowing users to clearly visualize the defects and quickly adjust their inspection parameters accordingly. Furthermore, LEICA INS 2000 is capable of generating defect summaries in a matter of seconds. This can be particularly useful for the finalize mask approval process. With this feature, users can quickly produce a list of detected abnormalities and present it to the process engineers in order to adjust their process parameters or further optimize their repair workflow. Finally, INS 2000 has WYSIWYG (What You See Is What You Get) capabilities, allowing users to instantly see the results of their inspection on screen. This feature is particularly useful for providing a quick feedback loop for process optimization. Overall, LEICA INS 2000 is a comprehensive mask and wafer inspection asset designed to help users reduce time to market and improve yields. With its advanced AOI capabilities, intuitive mask analysis and WYSIWYG capabilities, INS 2000 is an ideal choice for users who require precise and accurate inspection performance.