Used LEICA INS 3000 DUV #9265730 for sale

LEICA INS 3000 DUV is a state-of-the-art mask and wafer inspection equipment designed for advanced wafer fabrication applications. The system leverages a high-resolution imaging unit, an ultra-stable vibration isolation platform, and an advanced workflow software suite to accurately measure defects that can affect the performance of integrated circuits such as transistors and resistors. With its advanced technology, the machine can identify and measure defects during wafer fabrication, giving engineers a detailed understanding of the material's structural integrity and performance. INS 3000 DUV utilizes an ultra-stable platform for vibration isolation to guarantee an ideal environment for the detection of highly localized defects. Thanks to this special platform, the tool delivers exceptional imaging stability, which enables more accurate measurements. Additionally, the ultra-low illumination level allows for superior contrast and sensitivity in irregularities, as well as sub-micron resolution. The asset's sophisticated workflow software suite facilitates both data acquisition and analysis of defects. The software provides users with easy access to high-resolution images of patterns and defects, combined with various algorithms for defect evaluation and classification. Additionally, the software enables users to store large dimensions of wafer data and record traceability information. LEICA INS 3000 DUV is a powerful and reliable mask and wafer inspection model for the most demanding applications in the semiconductor industry. The equipment's sophisticated monitoring and analysis capabilities coupled with its superior imaging technology contribute to the highest level of accuracy in defect detection. The system's vibration isolation platform and advanced workflow software make for a secure and dependable tool that helps to reduce costs, improve yield rates, and ensure product quality.