Used LEICA INS 3000 #9186595 for sale

LEICA INS 3000 is a mask and wafer inspection equipment that enables precise and accurate measurements of high-density semiconductor products. This advanced technology enhances quality control and reduces the chance of errors. The system is comprised of two main components: an atomic force microscope (AFM) and a high-magnification optical microscope. The AFM is used to measure the three-dimensional shape of each wafer and to identify fine topographical features. The optical microscope uses a halogen lamp to detect defects in the wafer layers and photoresist patterns. LEICA INS-3000 features a large table-top setup to accommodate large wafer sizes. It has a precision manipulator to accurately move the wafer during inspection, and a tilt adjustment to adjust the angle of the microscope. The unit also incorporates sophisticated software that provides intuitive tools for inspecting multiple features at once. The process of inspecting each wafer with INS 3000 is automated. Once the operator places a wafer on the table, the inspection process is initiated. The machine will then use the AFM to measure the three-dimensional shape of the wafer and detect any defects the optical microscope may not have detected. INS-3000 includes a complete suite of post-processing software features to analyze the results of the inspection. It provides easy-to-read graphics and numeric values to quantify the accuracy of the measurements. The tool also generates detailed logs for analysis of any process changes. LEICA INS 3000 is a state-of-the-art wafer inspection asset that combines precision and accuracy. With its intuitive interface and powerful software, it's ideal for high-density semiconductor production and quality control. The model offers improved process control, higher reliability and better yield.