Used LEICA INS 3000 #9285578 for sale

LEICA INS 3000 is a comprehensive mask and wafer inspection equipment designed to provide precise inspection of pattern fidelity, defects, etching, and film thicknesses of electronic devices. Utilizing patented optical design and advanced imaging technologies, LEICA INS-3000 allows for sub-micron resolution imaging and feature analysis that can meet the most stringent industry standards and applications. The system incorporates a highly efficient algorithm and a modular optical scanning unit which provides precision imaging and inspection. INS 3000 uses a dual mask and wafer machine, allowing users to monitor and review on-site images in real-time. The tool features an independent laser diode illumination source with an adjustable light power output. The GRIN optics and polarization-sensitive extended depth of field (EDF) objectives further optimize imaging resolution and reduce the artifacting of features due to aberrations in the optical path. INS-3000 features a high-resolution digital Semiconductor Imager which captures images of isolated features on the wafer with a dynamic range of >4 orders of magnitude. The asset also includes an array of specialized signal processing techniques for throughput and noise reduction to ensure reliable defect detection and analysis. Additionally, LEICA INS 3000 utilizes a model of color-coded parameters which can be manipulated and fine-tuned in order to identify the most precise defects or features to enable the most accurate analysis. The mask and wafer imaging equipment is designed with advanced automated pattern recognition, making it possible to rapidly measure and detect even the smallest imperfections on a wafer. Through a fully customizable graphical user interface and a dynamic process control system, users can quickly configure the unit to meet their specific detection requirements and specifications. LEICA INS-3000 is ideal for electronic device prototyping, manufacturing, and failure analysis in the most advanced semiconductor technologies. The machine is capable of detecting and analyzing very small feature sizes (<0.5μm), and provides reliable results with high precision and repeatability. With its high throughput, low noise and intuitive features, INS 3000 delivers a comprehensive, cost-effective solution for mask and wafer inspection.