Used LEICA INS 3000 #9410355 for sale

LEICA INS 3000
ID: 9410355
Wafer defect inspection systems.
LEICA INS 3000 is a comprehensive mask and wafer inspection equipment designed for the semiconductor fabrication process. With its high throughput and low cost of ownership, this system is ideal for foundries, IDMs and leading-edge or standalone fabs. LEICA INS-3000 is built for maximum reliability and flexibility, offering true defect-free inspection capability for a wide variety of application needs. Its advanced optical and software technologies increase the speed and accuracy of inspections, ensuring all defects are quickly identified and eradicated. INS 3000 unit is composed of a sophisticated optical machine for wafer inspection and an integrated programmable mask inspection tool. Its optical component utilizes an automated line scanning microscope based on Fourier Optics, providing high resolution and contrast levels. A Grid Array of CCDs is integrated into the asset, increasing the inspection speed and efficiency. Precision scanners, lasers, telecentric projection optics and laser autofocus are all incorporated, allowing for a best-in-class defect detection capability. The model also features a programmable mask inspection equipment which uses a high-resolution, multi-wavelength imaging system integrated with the optical component. It is designed to detect defects on photomasks and reticles, with high sensitivity and contrast levels. The unit also has a powerful SuperMUM algorithm which can detect surface defects, such as scratches, fingerprints, etc., as well as edges, edges and corners, subpixel particles, and contaminants. In addition to its optical machine and mask inspection tool, INS-3000 also features a suite of software solutions for data analysis and reporting. It enables users to rapidly identify and classify defects as well as share reports with other members of the inspection team. An advanced 3D defect characterization asset is also integrated with the software, allowing users to get more detailed information about individual errors. The software is user-friendly and intuitive, allowing for better collaboration, decision-making and quality control. LEICA INS 3000 model is engineered for maximum performance and cost-effectiveness. Its robust design and advanced technologies ensure reliable, accurate and efficient defect detection. With its intuitive software, users can quickly identify and rectify issues before they become costly defects. LEICA INS-3000 is an ideal tool for the semiconductor industry and an excellent choice for fabrication facilities seeking a comprehensive, cost-effective and reliable mask and wafer inspection equipment.
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