Used LEICA INS 3300 #9393066 for sale

LEICA INS 3300 is a mask and wafer inspection equipment designed for the ultra-high resolution inspection of Advanced Patterning applications, including EUV and immersion. The system integrates an ultra-high resolution dual-column imaging unit with sophisticated inspection software to deliver comprehensive results for each inspected sample. The machine features a 25 gigapixel camera, providing up to 10x better imaging resolution than conventional optical systems. This ultra-high resolution is further enabled by LEICA proprietary state-of-the-art optics, which provide maximum image contrast and accurate magnification of even the most challenging process features. The software package included with LEICA INS3300 is robust and versatile, allowing users to quickly and easily create inspection plans and parameter sets for every application. The software features an intuitive graphical interface with powerful options for controlling the inspection process. It can also analyze and detect feature-specific defects, providing detailed reports on each inspected sample. INS 3300 also features a comprehensive suite of automated tools for improved accuracy and repeatability of inspection results. This includes precision alignment tools, automated merging of different images for detailed feature analysis, and real-time defect identification for rapid analysis. The tool is also designed for modularity and extensibility. customers looking to expand the asset's capabilities can do so by adding additional imaging units for multi-angle inspections, higher maximum magnification, or extended field of view. Overall, INS3300 is a sophisticated and advanced mask and wafer inspection model designed to meet the demands of today's most advanced patterning requirements. The equipment's ultra-high resolution imaging intuitive graphical interface, automated analysis tools and modular design make it an attractive choice for quality assurance laboratories.