Used LEICA / LEITZ MIS 200 #293615353 for sale

LEICA / LEITZ MIS 200 is a highly advanced mask & wafer inspection equipment designed for precision semiconductor device manufacturing. It utilizes high-resolution imaging and detection technologies to ensure all defects and foreign particles are identified, isolated and documented. This automated inspection system provides a total solution for analyzing and characterizing defects and particles in several layers simultaneously. The inspection unit's built-in hardware and software configures to quickly inspect, cross-match and analyze mask and wafer patterns. It also has wide range of automation capabilities, including automated wafer alignment, wafer rotation and conditioning. The machine is highly configurable, allowing users to customize the roll-in tool to meet specific process needs. LEICA MIS 200 uses high-resolution imaging for submicron accuracy and features fully integrated automatic tools for faster and more accurate wafer inspection. It also comes with proprietary algorithms for high-speed measuring, characterization of defects and particles, and defect localization. An advanced defect type recognition algorithm allows for automatic defect flagging and classification of defects. The asset provides powerful software for designing, editing and analyzing inspection results. An intuitive GUI helps to simplify and streamline the entire process. LEITZ MIS 200 also supports data review and analysis over multiple layers, so users can quickly identify and locate defects. In addition to its advanced hardware, MIS 200 comes with comprehensive service packages. These include on-site interventions, preventive maintenance, auditing and process analysis. This ensures that customers benefit from long-term service and rapid resolution of any problems. Overall, LEICA / LEITZ MIS 200 offers an advanced total solution for precise mask and wafer inspection and characterization. Its configurable hardware and software, coupled with comprehensive service packages, make it an ideal choice for semiconductor device fabrication needs.