Used LEICA / VISTEC 200 #9092984 for sale

LEICA / VISTEC 200 is an advanced mask and wafer inspection equipment designed for semiconductor manufacturing. The system uses advanced optical imaging technology to inspect masks and wafers for defects and contamination. LEICA 200 is ideally suited for production, research and development, diagnostics and failure analysis for both wafer and non-wafer devices. The unit consists of a high accuracy, variable magnification microscope that is used to acquire images of masks or wafers. An 8x objective lens is used to acquire images quickly and accurately. In addition, the images can be magnified up to 500x to reveal details that would otherwise be undetectable. VISTEC 200 offers powerful imaging and data acquisition features that enable the user to easily analyze mask and wafer images for defects. The machine is capable of generating images in a range of contrasts including false color, intensity and dual wavelength. It also supports a variety of image processing techniques including color mixing, spatial filtering, and non-linear scaling. The tool boasts an integrated defect detection asset that can be used to analyze the images for defects such as line edge roughness (LER), line width variation (LWV), and small bridges (SB). The defect detection model is customizable, and users can define inspection parameters for different types of devices and design rules. In addition to inspecting masks and wafers, 200 can also be used to inspect bonding pads, metal areas, Photomask transistors, photo vias, and more. The equipment is compatible with a wide range of mask and wafer materials, including those used in advanced wafer level packaging (WLP) processes. LEICA / VISTEC 200 is an advanced and highly reliable mask and wafer inspection system that offers users improved performance, reliability and cost of ownership. By using advanced optical imaging technology, the unit can easily detect a wide variety of defects, and this makes it an ideal choice for semiconductor manufacturers.