Used LEICA / VISTEC 3300 #9238318 for sale

LEICA / VISTEC 3300 mask and wafer inspection equipment is designed to help semiconductor manufacturers ensure the highest quality standards for their devices. With its high-precision optics and motion technology, the system enables fast and accurate detection of defects in mask and wafer manufacturing processes. The unit's design is based on a tabletop and vertical alignment platform, allowing for easy operation and adjustment of parts. Its optical systems are designed to provide users with high resolutions and shade accuracy with minimum effort and maximum reliability. Its scanning accuracy is designed to be accurate up to 2 μm and its automated focus technology ensures that focus stays fixed during the inspection process. In terms of illumination technology, LEICA 3300 uses a combination of LED light and diffused laser. The LED light, which is less expensive than laser technology, is used to provide a high-contrast image of wafer defects, while the diffused laser is used to inspect masks for finer defects. The machine also features an array of data capture and analysis tools which enable users to quickly and accurately detect and classify defects or irregularities. The tool also offers a range of analysis tools such as Visualization Analysis, Histogram analysis, and 3-D image reconstruction, allowing users to easily distinguish good and bad regions. In addition, its user-friendly interface allows users to accurately monitor and control the asset, providing an excellent user experience. The software features online help and model display parameters to assist users with tasks. VISTEC 3300 mask and wafer inspection equipment is designed for reliable operation in any environment and to provide an efficient manufacturing process. It is a must-have for semiconductor manufacturers who want to ensure that their products deliver the highest levels of quality and performance.