Used LEICA / VISTEC INS 2000 #146201 for sale

LEICA/VISITEC LEICA / VISTEC INS 2000 is a mask and wafer inspection equipment which combines advanced optics and image processing to deliver accurate, high speed, automated inspection. This system has the speed, precision and reliability to accurately detect the slightest structural defect on the surface of a photomask or wafer. The unit utilizes an advanced high-resolution, high-magnification optical machine that can detect defects as small as 0.5 µm on photomasks and 0.3 µm on wafers. This is possible due to a combination of an LED light source, high optical performance, fluorescence detection and LED illumination. Additionally, the mechanism is equipped with a motorized beam steering unit which allows for the scanning of precisely defined rectangular or circular regions for improved defect detection. This tool is capable of inspecting the entire surface of a mask or wafer with high resolution, high accuracy digital imaging. It can detect both contamination and defects in the details of an image, as well as imperfections, scratches, and other situations which would otherwise be very difficult to detect. The asset is also capable of automatically correcting misalignment of the mask or wafer before inspection, by registering the true and correct locations from the initial acquisition. This model also features high-speed automated defect review (DR) capability. This allows operators to quickly analyze images of detected defects and compare them against historical images in the equipment's database. This helps users identify defects quickly and accurately, which can facilitate their correction and prevention in the future. Additionally, the system is equipped with advanced data processing and analysis capabilities. This includes feature extraction and clustering algorithms, as well as automatic clustering and classification of images. The unit's advanced reporting capabilities can generate comprehensive, detailed reports which can be used by users to evaluate their processes. Overall, VISTEC/VISITEC LEICA INS 2000 is a powerful, highly efficient mask and wafer inspection machine. It offers precision, speed and reliability to detect the smallest defects on a photomask or wafer surface. Its advanced digital imaging and data processing capabilities give users the power to quickly and accurately analyze and address their processes, for improved product quality in loop.