Used LEICA / VISTEC INS 3000 DUV #9047301 for sale

LEICA / VISTEC INS 3000 DUV is a high performance mask and wafer inspection equipment designed to detect defects at the most advanced wafer level. The system utilizes a high resolution image sensor, advanced optics, and an advanced control algorithm to scan the edges and surface of a mask or wafer to ensure total defect-free quality. The unit is capable of detecting defects as small as 10nm in size, with a pixel size of 4 microns. The advanced optics of the machine allow for high resolution imaging, ensuring that any defects present on the surface of the mask or wafer are detected and identified. It can produce images with a resolution of up to 12 megapixels, giving an accurate inspection that can help to identify irregularities that would otherwise be difficult to detect. The tool also has a maximum field of view of 6.5 mm, providing a broad area for inspection. The asset also features a proprietary control algorithm that allows for total automation of the inspection process. This way, the inspector can quickly set up and customize the model to suit different pattern sizes, shapes, and orientations. This helps to reduce any time-consuming and tedious tasks related to mask and wafer inspection. The algorithm also allows for precise speed control of the inspection process, allowing the user to improve throughput without compromising accuracy. At the same time, the equipment has built-in safety features that protect the integrity of the inspection. For example, it has an auto-power off feature to minimize power consumption, as well as an auto-shutdown system that can be set according to the user's requirements. The unit is also designed to be safe for use in hazardous environments, as it is certified to meet international safety standards for CE, FCC, and UL. Furthermore, the machine also comes with an easy-to-use software package that provides a detailed view of the results. The user can customize the tool to fit their needs, as it includes various parameters such as the pattern size, detection algorithm, and speed settings. The data obtained from the inspection can be easily exported into popular image formats, allowing for further processing and analysis of the data. Overall, LEICA INS 3000 DUV is a high performance mask and wafer inspection asset that provides high accuracy and can help to ensure total defect-free quality. Its advanced optics and proprietary control algorithm allow for automation of the inspection process and improved productivity, while its safety features provide an extra layer of protection. All these features make the model a reliable and efficient tool for any inspection or quality control applications.