Used LEICA / VISTEC INS 3000 DUV #9047675 for sale
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ID: 9047675
Defect inspection system
Wafer-handling station two ports front load
Inspection and review application
Standard UV + High Performance DUV application
Automatic DIC Module
Pre-aligner for Macro-Inspection
KLARF input for Defect Review
ADR – Automatic defect review of KLARF files
Windows XP operating system
CCD Camera
Automatic high resolution inspections at 2.5X, 20X, 50X, 100X, and 150X (UV and DUV)
Unit offers bright-light macro inspection, dark-field, and DIC inspections
Operator console, track-ball, joy stick, motorized stage
Viscon application software
Defects from the KLARF (files from automatic inspection tool) can be reviewed in auto or manual mode.
LEICA / VISTEC INS 3000 DUV mask and wafer inspection equipment is a high-performance optical microscope system specifically designed for mask and wafer inspection. It provides the highest sensitivity and resolution required for critical process control. The unit combines a high-speed stereomicroscope, a digital image processor, and advanced software capabilities that enable inspection of optically complex mask and wafer features with high accuracy and precision. LEICA INS 3000 DUV has a high-speed, full-frame-rate stereomicroscope that provides highly detailed 3D images with fast, uninterrupted observations. The machine has a patented coherent light source for optimal contrast and image clarity. The incoherent focus tracking tool ensures an optimized focus for each pixel of the detector array. An auto-optimizer feature further adjusts the microscope parameters in real-time to optimize imaging performance. The asset also has an onboard digital image processor that processes, stores, and archives digital image files. It provides fast and powerful image processing through automatic zoning, regions of interest, and multi-layer display capabilities. The interface allows flexibility and custom analysis to meet all inspection requirements. The software also enables operators to quickly analyze data, mockup detailed profiles, and archive images. In addition to these features, VISTEC INS 3000 DUV has a 3D vector measurement suite that allows for accurate, real-time measurements. It also provides 3D color matrix and 2D measurement options, allowing analysis of any component size or shape. This feature allows for accurate, repeatable measurements in a variety of applications. INS 3000 DUV is a highly advanced mask and wafer inspection model that offers the highest levels of performance and accuracy. With its high sensitivity and resolution, it can detect even the smallest defects in masks and wafers. It provides fast imaging with high precision and detail, and advanced image processing capabilities for efficient data analysis. The 3D vector measurement suite ensures accurate, repeatable measurements. The equipment is ideal for process control in industrial and scientific applications.
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