Used LEICA / VISTEC INS 3300 2ei #9206797 for sale

LEICA / VISTEC INS 3300 2ei is a state of the art mask and wafer inspection equipment, designed to meet the highest standards of quality assurance in the semiconductor industry. It is an advanced, auto inspection technology for precise defect analysis across semiconductor materials from development and prototype stages through to production stages. The system features advanced optical and imaging technology, capturing digital images of mask and wafer surfaces that are scanned and processed at high speed. Compatible with various systems, it provides comprehensive 4D inspection capabilities, with a field of view of up to 17.6mm. The software features integrated AI and pattern recognition technologies that enable automated pattern recognition and defect detection/classification. Leveraging advanced 3D stitching technology, users can capture full top-down and side-view images of patterns with sub-micron accuracy. LEICA INS 3300 2ei also offers a wide range of high-sensitivity imaging and analysis tools to ensure maximum accuracy and reliability of defect detection. Minimal detect time is ensured by high speed, low noise inspection process. Comprehensive defect analysis including defect localization, side-view analysis and measuring is available thanks to advanced algorithms. The user-friendly graphic interface provides complete control over unit settings and allows for configuration of process parameters to meet different requirements. The soft-programmable parameters are ideal for process optimization and permit fast adaptation to changes in product mix. The machine can also be integrated into line monitoring systems for full traceability. In summary, VISTEC INS 3300 2ei is an advanced mask and wafer inspection tool designed especially for the semiconductor industry. Its combination of powerful imaging and analysis capabilities and comprehensive defect analysis makes it ideal for high-quality production processes. The auto-programmable functions makes it easy to set up and maintain asset performance, and integration into line monitoring systems makes it suitable for traceability.