Used LEICA / VISTEC INS 3300 #191088 for sale

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ID: 191088
Review station, 12" BROOKS AUTOMATION Fixload V6 Loadport Prealigner (3) Wafer changers Front load port Control panel: Joystick and trackball CCD Camera Lamphouse: 105/106 Z Halogene FFU Signal tower LCD Monitor, 19" Three-way illumination: Bright field Dark field DIC Objective lens: 2.5x / 0.07 PL Fluotar 10x / 0.30 BD HC PL Fluotar 20x / 0.50 BD HC PL Fluotar 50x / 0.85 BD PL APO 100x / 0.90 BD PL APO 150x / 0.90 BD PL APO Eyepieces: HC PLAN 10x / 25 (LEICA) 2004 vintage.
LEICA / VISTEC INS 3300 mask and wafer inspection equipment is designed to quickly inspect lithographer masks and wafers using a modular, high-sensitivity inspection tool. The system is well suited for inspecting semiconductor products post-fabrication and late build design cycles, helping ensure that individual components and assemblies meet specifications for product integrity and reliability, and during repair/rework operations. LEICA INS 3300 inspection unit provides high-speed and high-resolution imaging using an automated, full-field imaging machine. The tool is powered by a CCD camera capable of capturing both 2D and 3D images, and utilizes a motorized wafer stage that allows precision alignment of the mask and wafer. Automated image stitching technology ensures continuous inspection of the complete area in any rate or pattern, reducing the number of inspection sites while improving image performance. VISTEC INS 3300 asset also offers a variety of high-performance software tools for post-processing and analysis of captured images. The software includes defect classification algorithms for quick identification of anomalies, contrast optimization tools for highlighting defect characteristics, and powerful optical filters that allow users to adjust color and contrast levels for enhanced resolution. Users can also apply a variety of image analysis tools to identify and review target defects on masks and wafers. The advanced, user-friendly interface of INS 3300 model offers a wide range of features and options for customizing the inspection experience. The equipment provides automatic capture and analysis tools that enable users to design customized inspection routines, with parameters that can be configured to optimize the inspection procedure. In addition, the system also offers a powerful reporting tool to enable logging and review of inspection data. Overall, LEICA / VISTEC INS 3300 mask and wafer inspection unit provides reliable and comprehensive inspection capabilities for semiconductor products and any other production requirements that require accuracy and speed. With its high-resolution imaging, advanced software tools, easy-to-use interface, and customizable functionality, the machine is the perfect choice for any inspection or quality process.
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