Used LEICA / VISTEC INS 3300 #9043670 for sale

LEICA / VISTEC INS 3300 Mask & Wafer Inspection Equipment is designed for the efficient analysis of masks and wafers. It is suitable for the investigation of optical mask patterns and critical optical circuit elements at production, research, and development stages of semiconductor manufacturing. LEICA INS 3300 is designed for maximum work-flow integration, enabling it to be integrated into existing production lines. The optical system comprises a CCD-camera, a high-resolution LCD monitor, a precision x-y-z-tilt stage, and a highly efficient optical unit with an immersion objective lens and a center correction device. The machine can be used in conjunction with optional microscopy and imaging software (i.e. LEICA MOM Suite), making it an ideal tool for process monitoring and defect inspections. VISTEC INS 3300 tool offers a wide range of measurement functions from simple manual inspections to fully automated inspection sequences. The advanced inspection algorithms detect malfunctions in masks and wafers that are not visible to the eye, such as contamination, contamination related defects, un-expected pits, foreign objects, particles, or isolated spots. Furthermore, the asset has a unique 'edge trail' feature, which clearly displays a wafer or mask's outer edge. INS 3300 Mask & Wafer Inspection Model provides two scan/resolution options and two focus options. The high-resolution option provides an image resolution of 0.2µm and a scan speed of 300 line/s. The basic resolution offers an image resolution of 0.8µm and a scan speed of 200 line/s. The focus option can be set to manual or auto mode; in manual mode, the user can set the focus manually, and in auto mode, the equipment focuses automatically on the object surface. The system also includes high-quality components such as an integrated backlight illumination unit for bright, uniform lighting. An integrated cooling component ensures a stable and reliable machine performance even at higher temperatures. Furthermore, LEICA / VISTEC INS 3300 Mask & Wafer Inspection Tool is compliant with international standards such as SEMI-S2 and CENELEC-EN50660-2. LEICA INS 3300 Mask & Wafer Inspection Asset is a sophisticated inspection model, offering high-quality performance in the most challenging wafer and mask inspection tasks. It provides many advanced features for high-speed, accurate, and repeatability-critical investigations. All these features, together with its ease of integration into larger systems, make VISTEC INS 3300 equipment an excellent choice for the most comprehensive and reliable mask and wafer inspections.