Used LEICA / VISTEC INS 3300 #9099590 for sale

ID: 9099590
Wafer Size: 8"-12"
Vintage: 2003
Wafer inspection system, 8"-12" 2003 vintage.
LEICA / VISTEC INS 3300 is a state-of-the-art mask and wafer inspection equipment designed for the semiconductor industry. The system incorporates a unique combination of advanced technology, capability, and performance to provide highly reliable mask and wafer inspection results. The unit's advanced inspection technologies can detect defects on the order of 0.20 microns or smaller, making it one of the most accurate mask and wafer inspection systems available. LEICA INS 3300 machine is capable of testing a range of different substrates including quartz, glass, silicon, and most other semiconductor materials. Its high-precision optical tool provides exceptional image quality and resolution, making it suitable for extremely small feature sizes. The asset is configured with a high-resolution 12-mega-pixel CCD sensor and automated focusing, which helps improve imaging performance. The model features an automated stage with a high-speed approach and scan rates up to 100×100 μm per second. It has an integrated wafer stage for easy and reliable wafer handling and alignment. The equipment is also equipped with a high-power illumination system that can be configured for different wafer sizes and exposures. The unit is powered by a Linux-based OS and a powerful Pentium processor providing enough performance for data processing and analysis. The machine features intuitive user interface and advanced software that simplifies operation and data analysis. The GUI is colorcoded to enable fast and efficient review of results. VISTEC INS 3300 includes advanced inspection tools such as Critical Dimension (CD) tool, Edge Detection (ED) tool, OPC tool, and flaw detection. It is capable of detecting various types of defects such as particles, scratches, pits, and missing metal or oxide layers. The tool also provides a wide range of error correction options and sophisticated algorithm that can accurately locate and flag defects. The asset is designed to be highly reliable and durable under harsh working conditions while providing superior accuracy, speed, and repeatability. The model's environmentally-friendly design also helps reduce power consumption. INS 3300 is a powerful and reliable mask and wafer inspection equipment that is ideal for any semiconductor manufacturing process.
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