Used LEICA / VISTEC INS 3300 #9121040 for sale

ID: 9121040
Wafer Size: 12"
System, 12" Eyepiece: L/R, HC plan 10x/25 Control panel: joystick and trackball Keyboard System computer Prealigner Wafer changer wafer stage CCD Camera Clean air filter Loader unit: single type load port.
LEICA / VISTEC INS 3300 is a state-of-the-art mask & wafer inspection equipment designed for the most demanding semiconductor manufacturing applications. With its advanced optics and automation technologies, it enables a fast, accurate, repeatable, and reliable inspection. LEICA INS 3300 utilizes a unique closed-loop servo-based stage system with high-precision encoders to accurately control the position, orientation, and magnification of the sample wafer. This ensures consistent results across a wide variety of challenges. The unit is equipped with a highly advanced imaging machine that provides high resolution, fast scanning, and high contrast for highly detailed defect detection. It is equipped with a suite of powerful image analysis algorithms that enable reliable, repeatable, and accurate defect detection and characterization. In addition to the advanced optics and imaging tool, VISTEC INS 3300 includes a powerful automation asset that makes it possible to process a large number of wafers in a short time. The model is equipped with tool calibration and wafer calibration features that allow users to customize the process to ensure the highest possible accuracy and repeatability without sacrificing throughput. In addition, INS 3300 offers an intuitive and ergonomic user interface that makes it easy to control the equipment and analyze images. The system is also equipped with powerful data processing capabilities that allow users to quickly analyze results and create detailed reports. This ensures that defects are quickly identified and corrected and that production yields are maximized. Overall, LEICA / VISTEC INS 3300 is a powerful, reliable, and easy-to-use mask and wafer inspection unit. It is designed for use with a wide variety of semiconductor production processes, and it enables users to achieve the highest levels of accuracy, speed, and repeatability possible.
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