Used LEICA / VISTEC INS 3300 #9200027 for sale

LEICA / VISTEC INS 3300 Mask and Wafer Inspection Equipment is a leading edge dedicated inspection system for the inspection and characterisation of photo masks and wafers. This unit has been designed to utilise automated ADC (Inspection and Measurement Algorithms) as well as advanced out-of-plane measurement techniques. The machine features a unique automated mask inspection process to allow for in-plane film thickness analysis, as well as in-process inspection of overall mask feature performance. The tool is configured with optical components, a sample stage, and a high power CCD video camera. An automated inspector features a laser positioner and moveable head. The scan and measure features allow for automatic alignments, and features an advanced fault finding process for improved accuracy and higher throughput. The asset can also provide detailed mapping of wafer flatness and defect characterisation for various sized wafers and related materials. The wafer imaging is supported by the combination of both optical and X-ray microscopy to acquire images at near-atomic resolution. The mapping resolution is also sufficient to perform detailed analysis, allowing for determination of surface topography and defect location on the wafer. In terms of process control, LEICA INS 3300 features professional-grade feedback control to manage the temperature and power production of the wafers and materials. This ensures that the best possible image is acquired while also providing precise topographical levels of feature interaction on the wafer. The model has been manufactured following the strictest quality standards and ensuring that the highest accuracy samples are achieved. It has additionally been built to handle the most demanding inspection and testing environments, featuring an ASCII/RS232 interface to communicate with external systems, as well as a robust environmental enclosure for increased protection of the equipment components. Overall, VISTEC INS 3300 Mask and Wafer Inspection System is a high-end unit for advanced inspection and characterisation of photo masks and wafers. Its combination of automated inspection, measuring, and feedback control features creates a reliable and efficient machine for highly accurate imaging results.