Used LEICA / VISTEC LDS 3000 #293628458 for sale

LEICA / VISTEC LDS 3000
ID: 293628458
Defect inspection system.
LEICA / VISTEC LDS 3000 is an automated laser-based mask and wafer inspection equipment designed for the production of high-quality semiconductor devices. This system uses proprietary optical technology and advanced imaging systems to achieve defect-free inspection and repair of photomasks and wafers. It features three distinct optical paths, each designed to perform a different task. The first path is used to inspect masks and wafers at low magnification and is capable of detecting defects as small as one micrometer. The second path is optimized for inspecting defects at high magnification and is capable of resolving defects down to 0.2 micrometers. The third path is optimized for enhanced resolution of defects at extremely high magnification and is capable of detecting defects as small as 0.1 micrometer. LEICA LDS 3000 is capable of identifying two types of defects: nodules on the mask and particles on the wafer. It can detect defects due to the backside alignment, photomask misalignment, particle contamination, and optical defects such as missed elements and abrupt changes of reflectance. It can also detect defects caused by thin/thick elements, missing elements, shuttering errors, and misalignment. The unit also incorporates optical inspection technologies such as spectral imaging, polarization imaging and differential imaging to maximize defect detection capabilities. VISTEC LDS 3000 is a fully automated machine, featuring an interchangeable aperture tool and an intuitive user interface. It can be used in both automated and manual inspection modes. Automated inspection mode is optimal for production, while manual mode is best suited for identifying a small subset of detailed defects. LDS 3000 has the ability to store mask data, allowing for future analysis of data and helps to reduce overall production time. Furthermore, the asset features an alignment model for both the mask and wafers. This allows for rapid setup time and tight tracking of the masks and wafers during operations. LEICA / VISTEC LDS 3000 is designed to minimize overall production costs, reduce time to market, and maximize quality control. Its high-speed processing time and advanced imaging capabilities make it one of the most advanced inspection systems currently available on the market. This equipment is ideal for production of high-performance devices with limited space, as it allows for efficient and reliable detection of low-level defects in photomasks and wafers.
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